Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma treatment method, plasma treatment apparatus, and semiconductor device manufacturing method

Plasma treatment method, plasma treatment apparatus, and semiconductor device manufacturing method

US Patent 10074517 · Granted Sep 11, 2018

Estimated economic value: $649,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Solid-state imaging device, method of manufacturing solid-state imaging device, 2025
Enzyme sensor and electronic device2022
Dry etching equipment and method for producing semiconductor device2021
Film formation simulation method, program, and semiconductor processing system2021
State control apparatus, state control method, and state control system2020
Damage prediction method and semiconductor processing system2020
Information processing device, processing device, prediction method, and process2020
Etching characteristic estimation method, program, information processing appara2019
Imaging element, method for manufacturing imaging element, pixel design method, 2019
Simulating shape of a workpiece based on a flux2018
Simulation method, simulation program, processing apparatus, simulator, and desi2018
Imaging element, method for manufacturing imaging element, pixel design method, 2017