Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Magnetron sputtering source and arrangement with adjustable secondary magnet arrangement

Magnetron sputtering source and arrangement with adjustable secondary magnet arrangement

US Patent 10043642 · Granted Aug 7, 2018

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for producing a coating2025
UV curing device with divided UV reflecting mirrors2021
Infrared mirror with a thermally stable layer2020
Process monitoring for UV curing2018
Method for combination of light of different wavelengths2010
Device for combination of light of different wavelengths2008
Vacuum treatment system and process for manufacturing workpieces2007
Vacuum treatment system and process for manufacturing workpieces2004
Vacuum treatment system and process for manufacturing workpieces2003