Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025

High-purity yttrium, process of producing high-purity yttrium, high-purity yttrium sputtering target, metal gate film deposited with high-purity yttrium sputtering target, and semiconductor element and device equipped with the metal gate film

US Patent 10041155 · Granted Aug 7, 2018

Assignee

Inventors

View full patent text on Google Patents →