Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › High purity refractory metal powders and their use in sputtering targets which may have random texture

High purity refractory metal powders and their use in sputtering targets which may have random texture

US Patent 10023953 · Granted Jul 17, 2018

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Device and method for continuously producing an at least partly hollow shaft hav2025
Diffusion barriers for metallic superconducting wires2025
Tantalum based alloy that is resistant to aqueous corrosion2025
Diffusion barriers for metallic superconducting wires2024
Niobium-based alloy that is resistant to aqueous corrison2024
Corrosion-resistant glass melt electrodes and methods of using them2023
Diffusion barriers for metallic superconducting wires2023
Method for producing a polygonal shaft2023
Molybdenum containing targets2023
Tantalum based alloy that is resistant to aqueous corrosion2023
Microreactor systems and methods2023
Copper-alloy capping layers for metallization in touch-panel displays2023