Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025

Method for controlling the synthesis of a block copolymer containing at least one nonpolar block and at least one polar block and use of said block copolymer in applications of nanolithography by direct self-assembly

US Patent 10023677 · Granted Jul 17, 2018

Assignee

Inventors

View full patent text on Google Patents →