Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4650745 | Method of forming a resist pattern by radiation exposure of positive-working resist coating comprising a dye and a trihydroxybenzophenone compound and subsequent aqueous alkaline development | — | 1987-03-17 |
| 4626492 | Positive-working o-quinone diazide photoresist composition containing a dye and a trihydroxybenzophenone compound | — | 1986-12-02 |