Issued Patents All Time
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6048795 | Process of fabricating a semiconductor device having nitrogen-containing silicon layer and refractory metal layer | Shinji Fujieda, Yoshinao Miura | 2000-04-11 |
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6048795 | Process of fabricating a semiconductor device having nitrogen-containing silicon layer and refractory metal layer | Shinji Fujieda, Yoshinao Miura | 2000-04-11 |