Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9297701 | Electromagnetic wave detector with improved wavelength selection property | — | 2016-03-29 |
| 8785853 | Infrared sensor package and electronic device equipped therewith | Takao Yamazaki, Koji Kato | 2014-07-22 |
| 7777288 | Integrated circuit device and fabrication method therefor | Naoyoshi Kawahara, Hiroshi Murase, Hiroaki Ohkubo, Kuniko Kikuta, Yasutaka Nakashiba +2 more | 2010-08-17 |
| 7741692 | Integrated circuit device with temperature monitor members | Hiroaki Ohkubo, Yasutaka Nakashiba, Naoyoshi Kawahara, Hiroshi Murase, Naoki Oda +1 more | 2010-06-22 |
| 7462921 | Integrated circuit device, method of manufacturing the same and method of forming vanadium oxide film | Naoyoshi Kawahara, Hiroshi Murase, Hiroaki Ohkubo, Yasutaka Nakashiba, Naoki Oda +1 more | 2008-12-09 |
| 7417229 | Thermal-type infrared detection element | Masahiko Sano | 2008-08-26 |
| 7391092 | Integrated circuit including a temperature monitor element and thermal conducting layer | Hiroaki Ohkubo, Yasutaka Nakashiba, Naoyoshi Kawahara, Hiroshi Murase, Naoki Oda +1 more | 2008-06-24 |
| 7239002 | Integrated circuit device | Hiroaki Ohkubo, Kuniko Kikuta, Yasutaka Nakashiba, Naoyoshi Kawahara, Hiroshi Murase +2 more | 2007-07-03 |
| 6512229 | Process for preparing a bolometer material and bolometer device | — | 2003-01-28 |
| 6485619 | Method for forming metal oxide film | — | 2002-11-26 |
| 6413385 | Thin-film temperature-sensitive resistor material and production process thereof | — | 2002-07-02 |
| 6333270 | Etching gas used for plasma-enhanced etching of vanadium oxide film and method of plasma-enhanced etching of vanadium oxide film | — | 2001-12-25 |
| 6127914 | Thin-film temperature-sensitive resistor material and production process thereof | — | 2000-10-03 |
| 5966590 | Method for manufacturing thermal-type infrared sensor | Hideo Wada, Mitsuhiro Nagashima, Naoki Oda | 1999-10-12 |
| 5801383 | VOX film, wherein X is greater than 1.875 and less than 2.0, and a bolometer-type infrared sensor comprising the VOX film | Hideo Wada, Mitsuhiro Nagashima, Naoki Oda, Toru Mori | 1998-09-01 |
| 5290394 | Method of manufacturing a thin Hg.sub.1-x Cd.sub.x Te film | — | 1994-03-01 |