SM

Seiji Matsuura

NE Nec: 7 patents #2,006 of 14,502Top 15%
NE Nec Electronics: 3 patents #234 of 1,789Top 15%
MM Mitsubishi Materials: 2 patents #498 of 1,543Top 35%
SO Sony: 2 patents #12,963 of 25,231Top 55%
MI Mitsui Petrochemical Industries: 1 patents #503 of 1,024Top 50%
RE Renesas Electronics: 1 patents #2,739 of 4,529Top 65%
📍 Ibaraki, JP: #610 of 6,779 inventorsTop 9%
Overall (All Time): #320,530 of 4,157,543Top 8%
15
Patents All Time

Issued Patents All Time

Showing 1–15 of 15 patents

Patent #TitleCo-InventorsDate
10281821 Exposure apparatus, exposure method, and device manufacturing method 2019-05-07
7572558 Photomask and exposure method 2009-08-11
7537864 Hole pattern design method and photomask Masashi Fujimoto 2009-05-26
7295286 Exposure device and method of exposure 2007-11-13
6335125 Photomask and method of manufacturing same 2002-01-01
6310684 Method of measuring spherical aberration in projection system 2001-10-30
6271919 Semiconductor device and alignment apparatus and alignment method for same 2001-08-07
6208469 Method of adjusting reduction projection exposure device 2001-03-27
6200076 Cutting tool and method for producing the same Yasuyoshi Fujii, Kazuhiro Kaneko 2001-03-13
6160623 Method for measuring an aberration of a projection optical system Takayuki Uchiyama 2000-12-12
6084678 Method of alignment between mask pattern and wafer pattern 2000-07-04
6058807 Cutting tool and method for producing the same Yasuyoshi Fujii, Kazuhiro Kaneko 2000-05-09
6037411 Acoustic vibrational material of fiber reinforcement with epoxy resin and epoxy-reactive polybutadiene Kunihiko Tokura, Masaru Uryu 2000-03-14
6013395 Photomask for use in exposure and method for producing same 2000-01-11
5663220 Acoustic vibrational material from fiber-reinforced polybutadiene-modified epoxy resin Kunihiko Tokura, Masaru Uryu 1997-09-02