Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7974457 | Method and program for correcting and testing mask pattern for optical proximity effect | — | 2011-07-05 |
| 7058923 | OPTICAL PROXIMITY EFFECT CORRECTING METHOD AND MASK DATA FORMING METHOD IN SEMICONDUCTOR MANUFACTURING PROCESS, WHICH CAN SUFFICIENTLY CORRECT OPTICAL PROXIMITY EFFECT, EVEN UNDER VARIOUS SITUATIONS WITH REGARD TO SIZE AND SHAPE OF DESIGN PATTERN, AND SPACE WIDTH AND POSITION RELATION BETWEEN DESIGN PATTERNS | Takeshi Hamamoto | 2006-06-06 |
| 6570174 | OPTICAL PROXIMITY EFFECT CORRECTING METHOD IN SEMICONDUCTOR MANUFACTURING PROCESS, WHICH CAN SUFFICIENTLY CORRECT OPTICAL PROXIMITY EFFECT, EVEN UNDER VARIOUS SITUATIONS WITH REGARD TO SIZE AND SHAPE OF DESIGN PATTERN, AND SPACE WIDTH AND POSITION RELATION BETWEEN DESIGN PATTERNS | Takeshi Hamamoto | 2003-05-27 |
| 6519759 | Photomask pattern shape correction method and corrected photomask | — | 2003-02-11 |
| 6403477 | Method for correcting an optical proximity effect in an interconnect pattern by shortening the legs of cutout patterns to avoid linewidth reduction | — | 2002-06-11 |
| 6174633 | Method for correcting photocontiguous effect during manufacture of semiconductor device | — | 2001-01-16 |
| 5871874 | Mask pattern forming method capable of correcting errors by proximity effect and developing process | — | 1999-02-16 |
| 5627083 | Method of fabricating semiconductor device including step of forming superposition error measuring patterns | — | 1997-05-06 |
| 5357312 | Illuminating system in exposure apparatus for photolithography | — | 1994-10-18 |