Issued Patents All Time
Showing 26–50 of 51 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7419767 | Phase-shifting mask and method of forming pattern using the same | — | 2008-09-02 |
| 7383009 | Fixing device for use in an image forming device | — | 2008-06-03 |
| 7280794 | Fixing device for use in an image forming device | — | 2007-10-09 |
| 7271906 | Image processing alignment method and method of manufacturing semiconductor device | — | 2007-09-18 |
| 7186932 | Switch device | Takashi Ishii, Shigetoshi Fujitani, Takayuki Sakai, Atsushi Matsumoto, Takao Fukui | 2007-03-06 |
| D507543 | Push button switch | Takashi Ishii | 2005-07-19 |
| 6841890 | Wafer alignment mark for image processing including rectangular patterns, image processing alignment method and method of manufacturing semiconductor device | — | 2005-01-11 |
| 6835652 | Method of fabricating patterns with a dual damascene process | — | 2004-12-28 |
| 6812155 | Pattern formation method | — | 2004-11-02 |
| 6800402 | Phase-shifting mask and method of forming pattern using the same | — | 2004-10-05 |
| 6699626 | Mask set for use in phase shift photolithography technique which is suitable to form random patterns | — | 2004-03-02 |
| 6670632 | Reticle and method of fabricating semiconductor device | — | 2003-12-30 |
| 6645823 | Reticle and method of fabricating semiconductor device | — | 2003-11-11 |
| 6613483 | Mask for measuring optical aberration and method of measuring optical aberration | — | 2003-09-02 |
| 6580492 | Reticle system for measurement of effective coherence factors | — | 2003-06-17 |
| 6573015 | Method of measuring optical aberration | — | 2003-06-03 |
| 6522389 | Scanning exposure photo-mask and method of scanning exposure and scanning exposure system | — | 2003-02-18 |
| 6517982 | Mask set for use in phase shift photolithography technique which is suitable to form random patterns, and method of exposure process using the same | — | 2003-02-11 |
| 6449029 | Apparatus for providing levelling and focusing adjustments on a semiconductor wafer | — | 2002-09-10 |
| 6361903 | Method for predicting pattern width on semiconductor wafer and method for correcting mask pattern therethrough | — | 2002-03-26 |
| 6245585 | Method of providing levelling and focusing adjustments on a semiconductor wafer | — | 2001-06-12 |
| 6048648 | Mask including optical shield layer having variable light transmittance | Shuichi Hashimoto | 2000-04-11 |
| 4957625 | Ceramic filter modules in series with piston backwash | Yoshihisa Katoh, Takashi Ogawa, Mitsumasa Hasegawa, Masaaki Hayashi | 1990-09-18 |
| 4897204 | Process and apparatus for gas dissolution | Yoshihisa Katoh, Takashi Ogawa, Mitsumasa Hasegawa | 1990-01-30 |
| 4693918 | Tool for firing ceramics | Yoshihisa Kato | 1987-09-15 |