Issued Patents All Time
Showing 26–42 of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6406966 | Uniform emitter formation using selective laser recrystallization | — | 2002-06-18 |
| 6399455 | Method of fabricating a bipolar transistor with ultra small polysilicon emitter | — | 2002-06-04 |
| 6355544 | Selective high concentration doping of semiconductor material utilizing laser annealing | Stepan Essaian | 2002-03-12 |
| 6060392 | Fabrication of silicides by excimer laser annealing of amorphous silicon | Stepan Essaian | 2000-05-09 |
| 6010951 | Dual side fabricated semiconductor wafer | Sagar Pushpala | 2000-01-04 |
| 5966607 | Metal salicide process employing ion metal plasma deposition | Lay Chee | 1999-10-12 |
| 5911114 | Method of simultaneous formation of salicide and local interconnects in an integrated circuit structure | — | 1999-06-08 |
| 5866459 | Method of fabricating a contact structure for an MOS transistor entirely on isolation oxide | Mohsen Shenasa | 1999-02-02 |
| 5843834 | Self-aligned POCL.sub.3 process flow for submicron microelectronics applications using amorphized polysilicon | — | 1998-12-01 |
| 5824596 | POCl.sub.3 process flow for doping polysilicon without forming oxide pillars or gate oxide shorts | — | 1998-10-20 |
| 5807759 | Method of fabricating a contact structure for a raised source/drain MOSFET | Mohsen Shenasa | 1998-09-15 |
| 5780349 | Self-aligned MOSFET gate/source/drain salicide formation | — | 1998-07-14 |
| 5736419 | Method of fabricating a raised source/drain MOSFET using self-aligned POCl.sub.3 for doping gate/source/drain regions | — | 1998-04-07 |
| 4683645 | Process of fabricating MOS devices having shallow source and drain junctions | Hussein M. Naguib, Iain D. Calder, Vu Q. Ho | 1987-08-04 |
| 4680609 | Structure and fabrication of vertically integrated CMOS logic gates | Iain D. Calder, Thomas MacElwee | 1987-07-14 |
| 4476475 | Stacked MOS transistor | Hussein M. Naguib, Iain D. Calder, Albert R. Boothroyd | 1984-10-09 |
| 4415383 | Method of fabricating semiconductor devices using laser annealing | Iain D. Calder, Hussein M. Naguib | 1983-11-15 |