Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12272745 | Semiconductor device | Hiromitsu Kato, Masahiko Ogura, Toshiharu Makino, Satoshi Yamasaki, Tsubasa Matsumoto +1 more | 2025-04-08 |
| 11753740 | Diamond substrate and method for manufacturing the same | Hitoshi Noguchi, Tsubasa Matsumoto | 2023-09-12 |
| 11180865 | Foundation substrate for producing diamond film and method for producing diamond substrate using same | Hitoshi Noguchi, Toshiharu Makino, Masahiko Ogura, Hiromitsu Kato, Hiroyuki Kawashima +1 more | 2021-11-23 |
| 11066757 | Diamond substrate and freestanding diamond substrate | Hitoshi Noguchi, Shozo Shirai, Toshiharu Makino, Masahiko Ogura, Hiromitsu Kato +6 more | 2021-07-20 |
| 10253426 | Method for manufacturing diamond substrate | Hitoshi Noguchi, Shozo Shirai, Toshiharu Makino, Masahiko Ogura, Hiromitsu Kato +6 more | 2019-04-09 |
| 10100435 | Method for manufacturing diamond substrate | Hitoshi Noguchi, Shozo Shirai, Toshiharu Makino, Masahiko Ogura, Hiromitsu Kato +6 more | 2018-10-16 |
| 9711638 | Semiconductor device using diamond | Kazuhiro Oyama, Toshiharu Makino, Masahiko Ogura, Hiromitsu Kato, Daisuke Takeuchi +3 more | 2017-07-18 |
| 9136400 | Semiconductor device | Satoshi Tanimoto, Norihiko Kiritani, Toshiharu Makino, Masahiko Ogura, Hiromitsu Kato +2 more | 2015-09-15 |
| 8592824 | High efficiency indirect transition semiconductor ultraviolet light emitting device | Satoshi Yamasaki, Toshiharu Makino, Hideyo Ookushi, Hiromitsu Kato, Masahiko Ogura +3 more | 2013-11-26 |
| 7989260 | Method of selectively forming atomically flat plane on diamond surface, diamond substrate produced by the method, and semiconductor device using the same | Hitoshi Umezawa, Satoshi Yamasaki | 2011-08-02 |