CL

Chung-Hsin Lin

NT Nanya Technology: 4 patents #182 of 775Top 25%
Infineon Technologies Ag: 2 patents #3,160 of 7,486Top 45%
📍 New Taipei, TW: #3,127 of 10,472 inventorsTop 30%
Overall (All Time): #1,195,365 of 4,157,543Top 30%
4
Patents All Time

Issued Patents All Time

Showing 1–4 of 4 patents

Patent #TitleCo-InventorsDate
9659886 Method of fabricating semiconductor device having voids between top metal layers of metal interconnects Ping-Heng Wu, Chao-Wen Lay, Hung-Mo Wu, Ying-Cheng Chuang 2017-05-23
9418949 Semiconductor device having voids between top metal layers of metal interconnects Ping-Heng Wu, Chao-Wen Lay, Hung-Mo Wu, Ying-Cheng Chuang 2016-08-16
7413993 Process for removing a residue from a metal structure on a semiconductor substrate Ronald Gottzein, Jens Bachmann, Dirk Efferenn, Uwe Kahler, Wen-Bin Lin +1 more 2008-08-19
7157381 Method for providing whisker-free aluminum metal lines or aluminum alloy lines in integrated circuits Dirk Efferenn, Jens Hahn, Uwe Kahler, Jens Bachmann, Wen-Bin Lin +1 more 2007-01-02