Issued Patents All Time
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6756168 | Determining exposure time of wafer photolithography process | Jiunn Yann Yu, Chi Jui Yeh | 2004-06-29 |
| 6342426 | Method for protecting stepper alignment marks | Chung-Chih Yeh | 2002-01-29 |
| 6228661 | Method to determine the dark-to-clear exposure dose for the swing curve | — | 2001-05-08 |
| 6190928 | Method for actually measuring misalignment of via | Yung-Tsun Lo, Kuan-Chieh Huang | 2001-02-20 |