Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10741837 | Nickel-based positive electroactive materials | Dong Ren, Yingchao Yu | 2020-08-11 |
| 9268210 | Double-exposure mask structure and photolithography method thereof | Yung-Wen Hung, Cheng-Shuai LI | 2016-02-23 |