Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6548408 | METHOD OF MINIMIZING REPETITIVE CHEMICAL-MECHANICAL POLISHING SCRATCH MARKS, METHOD OF PROCESSING A SEMICONDUCTOR WAFER OUTER SURFACE, METHOD OF MINIMIZING UNDESIRED NODE-TO-NODE SHORTS OF A LENGTH LESS THAN OR EQUAL TO 0.3 MICRON, AND SEMICONDUCTOR PROCESSING METHOD | — | 2003-04-15 |
| 6180525 | Method of minimizing repetitive chemical-mechanical polishing scratch marks and of processing a semiconductor wafer outer surface | — | 2001-01-30 |