Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8492483 | ABA triblock copolymer and process for producing the same | Norihiro Yoshida, Takahito Mita, Ami Yamaguchi, Kazuhiko Haba, Goro Sawada | 2013-07-23 |
| 7521171 | Positive photosensitive resin, process for production thereof, and resist composition containing positive photosensitive resin | Takahito Mita | 2009-04-21 |