Issued Patents All Time
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6562700 | Process for removal of resist mask over low k carbon-doped silicon oxide dielectric material of an integrated circuit structure, and removal of residues from via etch and resist mask removal | Sam Gu, David Pritchard, Derryl D. J. Allman, Ponce Saopraseuth | 2003-05-13 |