Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6078502 | System having heat dissipating leadframes | Michael D. Rostoker, Nicholas F. Pasch | 2000-06-20 |
| 5666189 | Process for performing low wavelength photolithography on semiconductor wafer using afocal concentration | Michael D. Rostoker, Nicholas F. Pasch | 1997-09-09 |
| 5643830 | Process for manufacturing off-axis power branches for interior bond pad arrangements | Michael D. Rostoker, Nicholas F. Pasch | 1997-07-01 |
| 5591564 | Gamma ray techniques applicable to semiconductor lithography | Michael D. Rostoker, Nicholas F. Pasch | 1997-01-07 |
| 5572562 | Image mask substrate for X-ray semiconductor lithography | Michael D. Rostoker, Nicholas F. Pasch | 1996-11-05 |
| 5567570 | Gamma ray techniques applicable to semiconductor lithography | Michael D. Rostoker, Nicholas F. Pasch | 1996-10-22 |
| 5567655 | Method for forming interior bond pads having zig-zag linear arrangement | Michael D. Rostoker, Nicholas F. Pasch | 1996-10-22 |
| 5557066 | Molding compounds having a controlled thermal coefficient of expansion, and their uses in packaging electronic devices | Michael D. Rostoker, Nicholas F. Pasch | 1996-09-17 |
| 5554484 | Gamma radiation sensitive resist materials for semiconductor lithography | Michael D. Rostoker, Nicholas F. Pasch | 1996-09-10 |
| 5512395 | Image masks for semiconductor lithography | Michael D. Rostoker, Nicholas F. Pasch | 1996-04-30 |
| 5485243 | Afocal concentrator for low wavelength lithography, particularly for semiconductor lithography | Michael D. Rostoker, Nicholas F. Pasch | 1996-01-16 |
| 5478698 | Direct-write afocal electron-beam semiconductor lithography | Michael D. Rostoker, Nicholas F. Pasch | 1995-12-26 |
| 5453583 | Interior bond pad arrangements for alleviating thermal stresses | Michael D. Rostoker, Nicholas F. Pasch | 1995-09-26 |
| 5384487 | Off-axis power branches for interior bond pad arrangements | Michael D. Rostoker, Nicholas F. Pasch | 1995-01-24 |
| 5374974 | High speed shuttle for gating a radiation beam, particularly for semiconductor lithography apparatus | Michael D. Rostoker, Nicholas F. Pasch | 1994-12-20 |
| 5345310 | Identifying and compensating for slip-plane dislocations in photolithographic mask alignment | Michael D. Rostoker, Nicholas F. Pasch | 1994-09-06 |