Issued Patents All Time
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5500076 | Process for dynamic control of the concentration of one or more etchants in a plasma-enhanced etch process for formation of patterned layers of conductive material on integrated circuit structures | — | 1996-03-19 |
| 5348614 | Process for dynamic control of the concentration of one or more reactants in a plasma-enhanced process for formation of integrated circuit structures | — | 1994-09-20 |
| 5326427 | Method of selectively etching titanium-containing materials on a semiconductor wafer using remote plasma generation | — | 1994-07-05 |
| 5245790 | Ultrasonic energy enhanced chemi-mechanical polishing of silicon wafers | — | 1993-09-21 |