Issued Patents All Time
Showing 26–36 of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7884409 | Semiconductor device and method of fabricating the same | Yoon-Hae Kim, Myung-Soo Yeo, Hea-Yean Park | 2011-02-08 |
| 7867461 | Method for preparing of cerium oxide powder for chemical mechanical polishing and method for preparing of chemical mechanical polishing slurry using the same | Jun Seok Nho, Jang-Yul Kim, Jong Pil Kim, Seung Beom Cho, Min Jin Ko | 2011-01-11 |
| 7736530 | CMP slurry and method for polishing semiconductor wafer using the same | Seung Beom Cho, Jong Pil Kim, Jun Seok Nho, Jang-Yul Kim | 2010-06-15 |
| 7682584 | Cerium carbonate powder, cerium oxide powder, method for preparing the same, and CMP slurry comprising the same | Jun Seok Nho, Jong Pil Kim, Jang-Yul Kim, Seung Beom Cho | 2010-03-23 |
| 7524475 | Cerium oxide powder for one-component CMP slurry, preparation method thereof, one-component CMP slurry composition comprising the same, and method of shallow trench isolation using the slurry | Seung Beom Cho, Jun Seok Nho, Dong Mok Shin, Jong Pil Kim, Jang-Yul Kim +2 more | 2009-04-28 |
| 7338885 | Alignment mark and method for manufacturing a semiconductor device having the same | Hee-Sung Kang, Chang Hyun Park | 2008-03-04 |
| 7338874 | Highly integrated semiconductor device with silicide layer that secures contact margin and method of manufacturing the same | Young-Gun Ko | 2008-03-04 |
| 7179714 | Method of fabricating MOS transistor having fully silicided gate | You-Jean Chang, Hee-Sung Kang, Choong-Ryul Ryou | 2007-02-20 |
| 7098514 | Highly integrated semiconductor device with silicide layer that secures contact margin and method of manufacturing the same | Young-Gun Ko | 2006-08-29 |
| 6995447 | Silicon on insulator device having trench isolation layer and method for manufacturing the same | Tae-Jung Lee, Byung Sun Kim, Seung-Han Yoo, Myung-sun Shin, Sang Wook Park | 2006-02-07 |
| 6737706 | Silicon on insulator device having trench isolation layer and method for manufacturing the same | Tae-Jung Lee, Byung Sun Kim, Seung-Han Yoo, Myung-sun Shin, Sang Wook Park | 2004-05-18 |