Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11119404 | System and method for reducing printable defects on extreme ultraviolet pattern masks | Xiaochun Yang, Vikram Tolani | 2021-09-14 |
| 9334230 | Process of forming an amide | Soon Hyeok Hong, Subhash Ghosh, Senthilkumar Muthaiah, Cheng-Yi Chen, Xiangya Xu | 2016-05-10 |