YK

Yoshiki Kamata

KT Kabushiki Kaisha Toshiba: 10 patents #3,082 of 21,451Top 15%
Kioxia: 5 patents #270 of 1,813Top 15%
Toshiba Memory: 1 patents #1,210 of 1,971Top 65%
📍 Ibaraki, JP: #548 of 6,779 inventorsTop 9%
Overall (All Time): #288,493 of 4,157,543Top 7%
16
Patents All Time

Issued Patents All Time

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDate
12069872 Memory device and method of manufacturing memory device Takahiko Iizuka, Daisaburo Takashima, Ryu Ogiwara, Rieko FUNATSUKI, Misako Morota +2 more 2024-08-20
12029145 Memory device Bairu Yan, Kazuhiko Yamamoto 2024-07-02
11985834 Semiconductor memory device having memory layer extending between insulation layer and semiconductor layer Misako Morota, Yukihiro Nomura, Yoshiaki Asao 2024-05-14
11948636 Memory device Yoshiaki Asao, Yukihiro Nomura, Misako Morota, Daisaburo Takashima, Takahiko Iizuka +1 more 2024-04-02
11765916 Memory device and method of manufacturing memory device Takahiko Iizuka, Daisaburo Takashima, Ryu Ogiwara, Rieko FUNATSUKI, Misako Morota +2 more 2023-09-19
10559750 Nonvolatile memory device and method of manufacturing the same Yoshiaki Asao, Misako Morota, Yukihiro Nomura, Iwao Kunishima 2020-02-11
10283707 Superlattice memory having GeTe layer and nitrogen-doped Sb2Te3 layer and memory device having the same 2019-05-07
10177309 Memory device 2019-01-08
10153429 Memory device Yoshiaki Asao, Iwao Kunishima, Misako Morota 2018-12-11
10026780 Superlattice memory and crosspoint memory device 2018-07-17
10026895 Superlattice memory and crosspoint memory device 2018-07-17
9613961 Field-effect transistor and semiconductor device 2017-04-04
8575652 Semiconductor device and manufacturing method thereof 2013-11-05
8154082 Semiconductor device and manufacturing method thereof Yoshihiko Moriyama, Tsutomu Tezuka 2012-04-10
7986016 Semiconductor device and associated manufacturing methodology for decreasing thermal instability between an insulating layer and a substrate Akira Takashima 2011-07-26
6593618 MIS semiconductor device having an elevated source/drain structure Akira Nishiyama 2003-07-15