JN

Johji Nishio

KT Kabushiki Kaisha Toshiba: 78 patents #142 of 21,451Top 1%
Overall (All Time): #23,710 of 4,157,543Top 1%
78
Patents All Time

Issued Patents All Time

Showing 1–25 of 78 patents

Patent #TitleCo-InventorsDate
12406844 Wafer having a silicon carbide crystal layer with stacking faults provided on a silicon carbide base body and semiconductor device manufactured using the wafer Chiharu Ota, Tatsuo Shimizu, Ryosuke Iijima 2025-09-02
12148799 Semiconductor device, method for manufacturing semiconductor device, inverter circuit, drive device, vehicle, and elevator Tatsuo Shimizu, Yukio Nakabayashi, Chiharu Ota, Toshihide Ito 2024-11-19
11973116 Semiconductor device Chiharu Ota 2024-04-30
11848211 Semiconductor device, method for manufacturing semiconductor device, inverter circuit, drive device, vehicle, and elevator Tatsuo Shimizu, Yukio Nakabayashi, Chiharu Ota, Toshihide Ito 2023-12-19
11764269 Semiconductor device, semiconductor device manufacturing method, inverter circuit, driver device, vehicle, and elevator Tatsuo Shimizu, Yukio Nakabayashi, Chiharu Ota, Toshihide Ito 2023-09-19
11764059 Method for manufacturing substrate, method for manufacturing semiconductor device, substrate, and semiconductor device Tatsuo Shimizu 2023-09-19
11764270 Semiconductor device, method for manufacturing semiconductor device, inverter circuit, drive device, vehicle, and elevator Tatsuo Shimizu, Yukio Nakabayashi, Chiharu Ota, Toshihide Ito 2023-09-19
11621167 Semiconductor device, method for manufacturing semiconductor device, inverter circuit, drive device, vehicle, and elevator Tatsuo Shimizu, Yukio Nakabayashi, Chiharu Ota, Toshihide Ito 2023-04-04
11563090 Semiconductor device Tatsuo Shimizu 2023-01-24
11469301 Semiconductor device, semiconductor device manufacturing method, inverter circuit, driver device, vehicle, and elevator Tatsuo Shimizu, Yukio Nakabayashi, Chiharu Ota, Toshihide Ito 2022-10-11
11450745 Semiconductor device and method for manufacturing the same Tatsuo Shimizu, Takashi Shinohe 2022-09-20
11443946 Method for manufacturing silicon carbide base body, method for manufacturing semiconductor device, silicon carbide base body, and semiconductor device Chiharu Ota 2022-09-13
11424326 Semiconductor device Yukio Nakabayashi, Tatsuo Shimizu, Toshihide Ito, Chiharu Ota 2022-08-23
11245017 Semiconductor device, inverter circuit, drive device, vehicle, and elevator Shinya Kyogoku, Ryosuke Iijima 2022-02-08
11239079 Semiconductor device, method for manufacturing semiconductor device, inverter circuit, drive device, vehicle, and elevator Tatsuo Shimizu, Yukio Nakabayashi, Chiharu Ota, Toshihide Ito 2022-02-01
11152470 Method for manufacturing semiconductor device, method for manufacturing substrate, semiconductor device, substrate, and manufacturing apparatus of substrate Chiharu Ota, Ryosuke Iijima 2021-10-19
10998401 Semiconductor device having a base body of silicon carbide Chiharu Ota, Ryosuke Iijima 2021-05-04
10930732 Semiconductor device including a silicon carbide layer Mitsuhiro Kushibe, Tatsuo Shimizu 2021-02-23
10707306 Semiconductor device and method of manufacturing the same Tatsuo Shimizu, Ryosuke Iijima, Teruyuki Ohashi 2020-07-07
10680058 Semiconductor device having regions of different concentraton of lifetime killer impurity provided in a silicon carbide layer Mitsuhiro Kushibe, Tatsuo Shimizu 2020-06-09
10546932 Semiconductor device, substrate, method for manufacturing semiconductor device, and method for manufacturing substrate Tatsuo Shimizu, Mitsuhiro Kushibe 2020-01-28
10529558 Semiconductor device, substrate, method for manufacturing semiconductor device, and method for manufacturing substrate Tatsuo Shimizu, Mitsuhiro Kushibe 2020-01-07
10424640 Semiconductor device and method of manufacturing the same Tatsuo Shimizu, Ryosuke Iijima, Teruyuki Ohashi 2019-09-24
10312330 Method for fabricating semiconductor substrate, semiconductor substrate, and semiconductor device Ryosuke Iijima, Kazuto Takao, Takashi Shinohe 2019-06-04
10177009 Manufacturing method for semiconductor device including first and second thermal treatments Tatsuo Shimizu, Takashi Shinohe 2019-01-08