Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12265331 | Radiation-sensitive resin composition and method for forming resist pattern | Ryuichi NEMOTO, Kota Furuichi | 2025-04-01 |
| 11340528 | Production method of composition for resist top coat layer, method of forming resist pattern, production method of fluorine-containing resin, and method of improving water repellency of resist top coat layer | Sosuke Osawa, Kosuke Terayama, Kanako Ueda, Atsuto Nishii | 2022-05-24 |