Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5425843 | Process for semiconductor device etch damage reduction using hydrogen-containing plasma | Kenneth D. Saul | 1995-06-20 |
| 4978420 | Single chamber via etch through a dual-layer dielectric | — | 1990-12-18 |