YT

Yukio Takano

HI Hitachi: 7 patents #5,859 of 28,497Top 25%
FC Fuji Electric Co.: 3 patents #717 of 2,643Top 30%
HO Horiba: 2 patents #199 of 604Top 35%
RT Renesas Technology: 1 patents #1,991 of 3,337Top 60%
TO Toto: 1 patents #620 of 1,113Top 60%
📍 Kodaira, JP: #134 of 1,073 inventorsTop 15%
Overall (All Time): #388,978 of 4,157,543Top 10%
13
Patents All Time

Issued Patents All Time

Showing 1–13 of 13 patents

Patent #TitleCo-InventorsDate
6815741 III-V single crystal as well as method of producing the same, and semiconductor device utilizing the III-V single crystal Yoshihisa Fujisaki, Tsutomu Ishiba 2004-11-09
6733875 Porous member and method of manufacturing the same Ryuichi Kojo, Takayuki HIROTA 2004-05-11
6630697 GaAs single crystal as well as method of producing the same, and semiconductor device utilizing the GaAs single crystal Yoshihisa Fujisaki, Tsutomu Ishiba 2003-10-07
6297523 GaAs single crystal as well as method of producing the same, and semiconductor device utilizing the same Yoshihisa Fujisaki, Tsutomu Ishiba 2001-10-02
6294804 GaAs single crystal as well as method of producing the same, and semiconductor device utilizing the GaAs single crystal Yoshihisa Fujisaki, Tsutomu Ishiba 2001-09-25
5770873 GaAs single crystal as well as method of producing the same, and semiconductor device utilizing the GaAs single crystal Yoshihisa Fujisaki, Tsutomu Ishiba 1998-06-23
5733805 Method of fabricating semiconductor device utilizing a GaAs single crystal Yoshihisa Fujisaki, Tsutomu Ishiba 1998-03-31
4977307 Apparatus for heating sample within vacuum chamber Yoshihiko Motoi, Naoki Yamamoto 1990-12-11
4916720 X-ray analyzer Naoki Yamamoto, Yoshinori Hosokawa, Kenji Yoshino 1990-04-10
4837137 Electrophotographic photoreceptor Koichi Aizawa, Toyoki Kazama, Yukihisa Tamura 1989-06-06
4833055 Electrophotographic photoreceptor comprising amorphous silicon and amorphous carbon buffer layer Toyoki Kazama, Koichi Aizawa, Kenichi Hara, Toshiyuki Iijima 1989-05-23
4770966 Electrophotographic photosensitive material comprising amorphous carbon protective layer containing hydrogen and fluorine Toyoki Kazama, Koichi Aizawa, Kenichi Hara, Toshiyuki Iijima 1988-09-13
4276114 Semiconductor substrate and a manufacturing method thereof Masahiko Ogirima, Shigeru Aoki, Michiyoshi Maki, Shigeo Kato 1981-06-30