Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11703753 | Pellicles for photomasks, reticles including the photomasks, and methods of manufacturing the pellicles | Minhyun LEE, Hyeonjin Shin, Seongjun Park | 2023-07-18 |
| 11034847 | Hardmask composition, method of forming pattern using hardmask composition, and hardmask formed from hardmask composition | Minsu SEOL, Sangwon Kim, Hyeonjin Shin, Dongwook LEE, Seongjun Park +2 more | 2021-06-15 |
| 10996556 | Pellicles for photomasks, reticles including the photomasks, and methods of manufacturing the pellicles | Minhyun LEE, Hyeonjin Shin, Seongjun Park | 2021-05-04 |
| 10928723 | Pellicle for photomask, reticle including the same, and exposure apparatus for lithography | Hyeonjin Shin, Hyunjae Song, Seongjun Park, Keunwook Shin, Changseok LEE +3 more | 2021-02-23 |
| 10808142 | Method of preparing graphene quantum dot, hardmask composition including the graphene quantum dot obtained by the method, method of forming patterns using the hardmask composition, and hardmask formed from the hardmask composition | Sangwon Kim, Minsu SEOL, Hyeonjin Shin, Dongwook LEE, Yunseong LEE +1 more | 2020-10-20 |
| 10777412 | Hardmask composition, method of preparing the same, and method of forming patterned layer by using the hardmask composition | Dongwook LEE, Sangwon Kim, Minsu SEOL, Seongjun Park, Hyeonjin Shin +2 more | 2020-09-15 |
| 10551735 | Pellicle composition for photomask, pellicle for photomask formed from the pellicle composition, method of forming the pellicle, reticle including the pellicle, and exposure apparatus for lithography including the reticle | Hyeonjin Shin, Sangwon Kim, Seongjun Park, Minsu SEOL, Dongwook LEE +2 more | 2020-02-04 |
| 10424490 | Hardmask composition, method of forming pattern using the hardmask composition, and hardmask formed from the hardmask composition | Sangwon Kim, Minsu SEOL, Hyeonjin Shin, Dongwook LEE | 2019-09-24 |
| 10312100 | Conductor including nano-patterned substrate and method of manufacturing the conductor | Wonhee Ko, Hyowon Kim, Jiyeon KU, Donggyu Kim, Seunghwa Ryu | 2019-06-04 |
| 10138543 | Method of analyzing growth of two-dimensional material | Jaeho Lee, Seongjun Park | 2018-11-27 |
| 9929238 | Graphene-containing device having graphene nanopatterns separated by narrow dead zone distance | Seongjun Park, Yunseong LEE | 2018-03-27 |
| 9882074 | Optoelectronic device | Jaehyun Yang, Hyena Kwak, Hyoungsub Kim, Hoojeong Lee, Seongjun Park | 2018-01-30 |
| 9748108 | Method of forming graphene nanopattern by using mask formed from block copolymer | Seongjun Park, Yunseong LEE | 2017-08-29 |