| 7706152 |
DC-DC converter for low voltage power source |
Bing W. Shen, Cynthia Watkins, Rama Venkatasubramanian |
2010-04-27 |
| 7112536 |
Plasma processing system and method |
Robert J. Markunas, Gaius Gillman Fountain, Jr. |
2006-09-26 |
| 6558504 |
Plasma processing system and method |
Robert J. Markunas, Gaius Gillman Fountain, Jr. |
2003-05-06 |
| 6552295 |
Plasma furnace disposal of hazardous wastes |
Robert J. Markunas, John Posthill, Raymond Thomas |
2003-04-22 |
| 6105518 |
Durable plasma treatment apparatus and method |
Anthony E. Robson, Ronald A. Rudder, Moses M. David, James V. Burt |
2000-08-22 |
| 5908565 |
Line plasma vapor phase deposition apparatus and method |
Tatsuo Morita, Robert J. Markunas, Gill Fountian, Masataka Itoh |
1999-06-01 |
| 5874014 |
Durable plasma treatment apparatus and method |
Anthony E. Robson, Ronald A. Rudder, Moses M. David, James V. Burt |
1999-02-23 |
| 5800620 |
Plasma treatment apparatus |
Ronald A. Rudder, George Carlton Hudson |
1998-09-01 |
| 5643639 |
Plasma treatment method for treatment of a large-area work surface apparatus and methods |
Ronald A. Rudder, George Carlton Hudson |
1997-07-01 |
| 5480686 |
Process and apparatus for chemical vapor deposition of diamond films using water-based plasma discharges |
Ronald A. Rudder, George Carlton Hudson, Robert J. Markunas, Michael J. Mantini |
1996-01-02 |
| 5418018 |
Chemical vapor deposition of diamond films using water-based plasma discharges |
Ronald A. Rudder, George Carlton Hudson, Robert J. Markunas |
1995-05-23 |
| 5180435 |
Remote plasma enhanced CVD method and apparatus for growing an epitaxial semiconductor layer |
Robert J. Markunas, Ronald A. Rudder |
1993-01-19 |
| 5018479 |
Remote plasma enhanced CVD method and apparatus for growing an epitaxial semconductor layer |
Robert J. Markunas, Ronald A. Rudder |
1991-05-28 |
| 4870030 |
Remote plasma enhanced CVD method for growing an epitaxial semiconductor layer |
Robert J. Markunas, Ronald A. Rudder |
1989-09-26 |
