PL

Peter Leunissen

IM Imec: 1 patents #297 of 687Top 45%
📍 Hamme-Mille, BE: #10 of 16 inventorsTop 65%
Overall (All Time): #3,310,232 of 4,157,543Top 80%
1
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Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
7838209 Method of reducing the impact of stray light during optical lithography, devices obtained thereof and masks used therewith Young-Chang Kim 2010-11-23