Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6638690 | Method for producing multi-layer circuits | Kurt Meier | 2003-10-28 |
| 5759740 | High resolution i-line photoresist of high sensitivity | Reinhard Schulz, Heinz Holzwarth, Stephan Ilg | 1998-06-02 |
| 5650262 | High-resolution negative photoresist with wide process latitude | Reinhard Schulz, Heinz Holzwarth | 1997-07-22 |
| 5627011 | High resolution i-line photoresist of high sensitivity | Reinhard Schulz, Heinz Holzwarth, Stephan Ilg | 1997-05-06 |
| 5436098 | Positive photoresists with enhanced resolution and reduced crystallization containing novel tetra(hydroxyphenyl)alkanes | Reinhard Schulz, Martin Roth, Wilhelm Knobloch | 1995-07-25 |
| 5397680 | Positive photoresist having improved processing properties | Ulrich Schadeli | 1995-03-14 |
| 5369200 | Positive photoresist having improved processing properties | Ulrich Schadeli | 1994-11-29 |
| 5296330 | Positive photoresists containing quinone diazide photosensitizer, alkali-soluble resin and tetra(hydroxyphenyl) alkane additive | Reinhard Schulz, Martin Roth, Wilhelm Knobloch | 1994-03-22 |