Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10892171 | Removal apparatus for removing residual gas and substrate treating facility including the same | Heokjae Lee, Hahn Park, Jae Boo Kim, Dongil Yoon, Se Un Park +4 more | 2021-01-12 |
MH
MinYoung Hwang
Overall (All Time): #2,704,718 of 4,157,543Top 70%
1
Patents All Time