Issued Patents All Time
Showing 1–25 of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6664021 | Photosensitive polymide precursor resin composition | Hirotoshi Maeda, Eiji Watanabe, Kouichi Katou | 2003-12-16 |
| 5589319 | Photosensitive polyimide resin composition | Kouichi Katou, Eiji Watanabe | 1996-12-31 |
| 5473040 | Polyimidesiloxane film of low heat-conductivity | Toshiharu Aono | 1995-12-05 |
| 5449588 | Photosensitive polyimide precursor composition with photoacid generator | Hirotoshi Maeda, Eiji Watanabe, Kouichi Katou | 1995-09-12 |
| 5449705 | Silicon-containing polyamic acid derivative and photosensitive resin composition using it | Eiji Watanabe, Kouichi Katou, Hirotoshi Maeda | 1995-09-12 |
| 5442024 | Photosensitive polyimide precursor composition | Hirotoshi Maeda, Kouichi Katou, Eiji Watanabe | 1995-08-15 |
| 5342739 | Method of preparing a negative pattern utilizing photosensitive polymer composition containing quinonediazide compound and a poly(amido)imide precursor | Kouichi Katou, Hirotoshi Maeda | 1994-08-30 |
| 5326792 | Polyimide photosensitive cover coating agent | Yoshinori Masaki, Hirotoshi Maeda | 1994-07-05 |
| 5320935 | Method of forming a pattern from a photosensitive heat-resistant poly(amide)imide having hydroxyphenyl groups | Hirotoshi Maeda | 1994-06-14 |
| 5300627 | Adhesive polyimide film | Yoshihiro Soeda, Setsuo Itami, Kazutsune Kikuta | 1994-04-05 |
| 5298359 | Photosensitive heat-resistant polymer having hydroxyphenyl group for forming a patterned image | Hirotoshi Maeda | 1994-03-29 |
| 5294696 | Process for producing polyisoimide | Hirotoshi Maeda | 1994-03-15 |
| 5084557 | Diamino compounds and liquid crystal aligning films | Shizuo Murata, Naoyoshi Emoto, Kenji Furukawa, Ryuji Kobayashi, Masami Tanaka | 1992-01-28 |
| 5071908 | Silicon polyimide precursor composition | Ryuji Kobayashi | 1991-12-10 |
| 5055549 | Process for preparing photosensitive heat-resistant polymer | Hirotoshi Maeda | 1991-10-08 |
| 5026788 | Photosensitive polymer having thiol group | Hirotoshi Maeda | 1991-06-25 |
| 5025088 | Photosensitive poly(amide)imide heat-resistant polymer | Hirotoshi Maeda | 1991-06-18 |
| 4970283 | Silicon-containing soluble polyimide precursor, its cured material, and method for preparing them | Haruo Kato, Yoshiya Kutsuzawa | 1990-11-13 |
| 4963635 | Processes for the production of silicon-containing polyimides precursors, and their cured polyimides low in hygroscopicity | Yoshiya Kutsuzawa | 1990-10-16 |
| 4959437 | Process for producing a low thermally expansive and highly adhesive silicon-containing polyimide and a precursor thereof | Yoshiya Kutsuzawa, Shiro Konotsune | 1990-09-25 |
| 4923968 | Melt-moldable crystalline polyimide polymer | Kazutsune Kikuta, Takao Kawamoto, Shiro Konotsune | 1990-05-08 |
| 4904758 | Low-melting polyimide copolymer and method for preparing the same | Hirotoshi Maeda | 1990-02-27 |
| 4864008 | Diamond compounds and liquid crystal aligning films | Shizuo Murata, Naoyoshi Emoto, Kenji Furukawa, Ryuji Kobayashi, Masami Tanaka | 1989-09-05 |
| 4818806 | Process for producing highly adherent silicon-containing polyamic acid and corsslinked silicon-containing polyimide | Yoshiya Kutsuzawa, Hiromi Egawa, Shiro Konotsune | 1989-04-04 |
| 4672099 | Soluble polyimide-siloxane precursor, process for producing same and cross-linked polyimide-siloxane | Yoshiya Kutsuzawa, Shiro Konotsune | 1987-06-09 |