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Method of correcting mask pattern and mask, method of exposure, apparatus thereof, and photomask and semiconductor device using the same |
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2001-06-19 |
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Method of correcting mask pattern and mask, method of exposure, apparatus thereof, and photomask and semiconductor device using the same |
— |
2000-11-28 |
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Correction method and correction apparatus of mask pattern |
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2000-05-23 |
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Correction method and correction apparatus of mask pattern |
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2000-05-02 |
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Correction method and correction apparatus of mask pattern |
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2000-03-28 |
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Method of correcting mask pattern and mask, method of exposure, apparatus thereof, and photomask and semiconductor device using the same |
— |
2000-01-11 |
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Method and apparatus for correcting exposure patterns, and exposure mask, method of exposing and semiconductor device |
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1999-11-23 |
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Correction method and correction apparatus of mask pattern |
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1999-10-19 |
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Correction method and correction apparatus of mask pattern |
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1998-10-20 |
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Method of estimation of resist pattern and method of exposure based on same |
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1998-04-07 |
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Method of producing photomask and exposing |
Minoru Sugawara |
1998-03-03 |
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Method of producing photomask and exposing |
Minoru Sugawara |
1996-09-24 |