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Integrated circuit memory devices having impurity-doped dielectric regions therein and methods of forming same |
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Integrated circuit memory devices having impurity-doped dielectric regions therein and methods of forming same |
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Vertical memory devices and methods of manufacturing the same |
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Vertical-type nonvolatile memory device and method of manufacturing the same |
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2016-08-30 |
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Vertical memory devices and method of manufacturing the same |
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Method of fabricating semiconductor device having preliminary stacked structure with offset oxide etched using gas cluster ion |
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Methods of forming vertical type semiconductor devices including oxidation target layers |
Phil Ouk Nam, Byong-Hyun Jang, Ki-Hyun Hwang, Jae Young Ahn |
2015-07-14 |
| 8987805 |
Vertical type semiconductor devices including oxidation target layers |
Phil Ouk Nam, Byong-Hyun Jang, Ki-Hyun Hwang, Jae Young Ahn |
2015-03-24 |
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Vertical structure non-volatile memory device and method of manufacturing the same |
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Method of manufacturing semiconductor device |
Phil Ouk Nam, Ki-Hyun Hwang, Jae Young Ahn, Han-Mei Choi, Bi-O Kim |
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| 8497142 |
Methods of forming conductive layer patterns using gas phase cleaning process and methods of manufacturing semiconductor devices |
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Methods of manufacturing semiconductor devices |
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Charge trap flash memory device and memory card and system including the same |
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Methods of manufacturing charge trap type memory devices |
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Nonvolatile memory device and method of fabricating the same |
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