Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11440118 | Resistance welding a porous metal layer to a metal substrate | Steven Seelman, Clarence M. Panchison, Emmanuel L. Uzuyem, Carlos Holguin | 2022-09-13 |
| 10709523 | Thin film tantalum coating for medical implants | Steven Seelman | 2020-07-14 |
| 10537961 | Resistance welding a porous metal layer to a metal substrate | Steven Seelman, Clarence M. Panchison | 2020-01-21 |
| 10427235 | Resistance welding a porous metal layer to a metal substrate | Steven Seelman, Clarence M. Panchison, Emmanuel L. Uzuyem, Carlos Holguin | 2019-10-01 |
| 10039619 | Thin film tantalum coating for medical implants | Steven Seelman | 2018-08-07 |
| 9730743 | Trochanter attachment device | Timothy A. Hoeman, Jorge Montoya, Louis Kwong, Ray Zubok, Keith A. Roby +2 more | 2017-08-15 |
| 9398953 | Micro-alloyed porous metal having optimized chemical composition and method of manufacturing the same | Steven Seelman | 2016-07-26 |
| 9277998 | Chemical vapor infiltration apparatus and process | Steven Seelman, David B. Roberts | 2016-03-08 |
| 9205171 | Hydrogen out gas of porous metal scaffold | Edward M. Willis, Mae Abiog | 2015-12-08 |
| 9192476 | Pyrolytic carbon implants with porous fixation component and methods of making the same | Brian H. Thomas, Oludele O. Popoola, Steven Seelman, Jeffrey P. Anderson | 2015-11-24 |
| 9174297 | Resistance welding a porous metal layer to a metal substrate | Steven Seelman, Clarence M. Panchison | 2015-11-03 |
| 9050150 | Trochanter attachment device | Timothy A. Hoeman, Jorge Montoya, Louis Kwong, Ray Zubok, Keith A. Roby +2 more | 2015-06-09 |
| 8956683 | Chemical vapor infiltration apparatus and process | Steven Seelman, David B. Roberts | 2015-02-17 |
| 8734514 | Micro-alloyed porous metal having optimized chemical composition and method of manufacturing the same | Steven Seelman | 2014-05-27 |
| 6063442 | Bonding of porous materials to other materials utilizing chemical vapor deposition | Robert C. Cohen | 2000-05-16 |