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Self-cleaning camera lens system and method |
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2025-01-07 |
| 9338413 |
Imaging systems with image pixels having adjustable spectral responses |
Brian Keelan, Brian A. Vaartstra |
2016-05-10 |
| 9202833 |
Imaging systems with baffle grids |
— |
2015-12-01 |
| 9179110 |
Imaging systems with modified clear image pixels |
Gershon Rosenblum, Alexandre G. Dokoutchaev |
2015-11-03 |
| 9172892 |
Imaging systems with image pixels having varying light collecting areas |
Alexandre G. Dokoutchaev, Richard Holscher, Gershon Rosenblum, Gennadiy Agranov |
2015-10-27 |
| 9093579 |
Dielectric barriers for pixel arrays |
Ulrich Boettiger, Mattia Cichocki, Loriston Ford, Rick Holscher, Mitchell J. Mooney +1 more |
2015-07-28 |
| 7823440 |
Systems and methods for characterizing thickness and topography of microelectronic workpiece layers |
Gurtej S. Sandhu |
2010-11-02 |
| 7760329 |
Optimized optical lithography illumination source for use during the manufacture of a semiconductor device |
William A. Stanton |
2010-07-20 |
| 7538858 |
Photolithographic systems and methods for producing sub-diffraction-limited features |
— |
2009-05-26 |
| 7283205 |
Optimized optical lithography illumination source for use during the manufacture of a semiconductor device |
William A. Stanton |
2007-10-16 |
| 7130022 |
Methods and systems for controlling radiation beam characteristics for microlithographic processing |
William A. Stanton |
2006-10-31 |
| 7053987 |
Methods and systems for controlling radiation beam characteristics for microlithographic processing |
Willilam A. Stanton |
2006-05-30 |
| 7046339 |
Optimized optical lithography illumination source for use during the manufacture of a semiconductor device |
William A. Stanton |
2006-05-16 |
| 6894765 |
Methods and systems for controlling radiation beam characteristics for microlithographic processing |
William A. Stanton |
2005-05-17 |