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Single metal dual dielectric CMOS device |
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Transistor device and a method of manufacturing the same |
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Complementary semiconductor device with a metal oxide layer exclusive to one conductivity type |
— |
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Semiconductor device and method of manufacturing such a semiconductor device |
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Method of manufacturing a semiconductor device |
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Method of manufacturing MOS transistors with gate electrodes formed in a packet of metal layers deposited upon one another |
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Semiconductor device fabricated by a method of reducing the contact resistance of the connection regions |
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Method for fabricating semiconductor devices having silicided electrodes |
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2007-06-05 |
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Method for reducing the contact resistance of the connection regions of a semiconductor device |
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2007-03-13 |
