Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12260164 | Method for designing pattern layout including oblique edges and method for manufacturing semiconductor device using the same | Sangoh Park, Jinho Lee | 2025-03-25 |
| 11740553 | Method of manufacturing photomask set for forming patterns | Sangoh Park, Sunggon Jung | 2023-08-29 |
| 11506983 | Method of designing mask layout based on error pattern and method of manufacturing mask | Sangoh Park, Seunghune Yang | 2022-11-22 |
| 11226552 | Method of manufacturing photomask set for forming patterns, and method of manufacturing semiconductor device using the photomask set | Sangoh Park, Sunggon Jung | 2022-01-18 |