Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10889889 | High purity copper sputtering target material | Satoru Mori, U Tani, Yuuji Sato, Isao Arai | 2021-01-12 |
| 9472380 | Silicon part for plasma etching apparatus and method of producing the same | Yoshinobu Nakada | 2016-10-18 |