Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7025668 | Gradient polishing pad made from paper-making fibers for use in chemical/mechanical planarization of wafers | Angela Petroski, Richard D. Cooper, Paul Fathauer | 2006-04-11 |
| 6979256 | Retaining ring with wear pad for use in chemical mechanical planarization | Richard D. Cooper, Paul Fathauer, Angela Mroczek-Petroski, James Macey | 2005-12-27 |
| 6964601 | Method for securing a polishing pad to a platen for use in chemical-mechanical polishing of wafers | Angela Petroski, Richard D. Cooper, Paul Fathauer, James Macey | 2005-11-15 |
| 6945846 | Polishing pad for use in chemical/mechanical planarization of semiconductor wafers having a transparent window for end-point determination and method of making | Angela Petroski, Richard D. Copper, Paul Fathauer | 2005-09-20 |
| 6899610 | Retaining ring with wear pad for use in chemical mechanical planarization | Richard D. Cooper, Paul Fathauer, Angela Mroczek-Petroski, James Macey | 2005-05-31 |
| 6875077 | Polishing pad for use in chemical/mechanical planarization of semiconductor wafers having a transparent window for end-point determination and method of making | Angela Petroski, Richard D. Copper, Paul Fathauer | 2005-04-05 |
| 6863774 | Polishing pad for use in chemical-mechanical planarization of semiconductor wafers and method of making same | Richard D. Cooper, Paul Fathauer, Angela Mroczek-Petroski, James J. Petroski | 2005-03-08 |
| 6189896 | Controlled leakage rotating seal ring with elements for receiving and holding a lubricant on a face thereof | Alan M. Dickey, Kristy J. Johnson | 2001-02-20 |