Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12227674 | Polishing composition comprising polishing particles having high water affinity | Shigeru Mitsui, Tohru Nishimura | 2025-02-18 |
| 11984320 | Method for polishing silicon wafer with reduced wear on carrier, and polishing liquid used therein | Hayato Yamaguchi, Yusuke Tanatsugu | 2024-05-14 |
| 11884844 | Composition for post-polishing to be used after primary polishing of silicon wafers | Hibiki Ishijima | 2024-01-30 |
| 11873420 | Cation-containing polishing composition for eliminating protrusions around laser mark | Hayato Yamaguchi, Hibiki Ishijima | 2024-01-16 |
| 11621171 | Method for polishing silicon wafer with reduced wear on carrier, and polishing liquid used therein | Hayato Yamaguchi, Yusuke Tanatsugu | 2023-04-04 |
| 11459486 | Polishing composition containing amphoteric surfactant | Hiroaki Sakaida | 2022-10-04 |
| 10865113 | Method for producing purified aqueous solution of silicic acid | Hiroaki Sakaida | 2020-12-15 |