Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6692878 | Photomask frame modification to eliminate process induced critical dimension control variation | Wilman Tsai, Frederick Chen, Jeff Farnsworth | 2004-02-17 |
| 6485869 | Photomask frame modification to eliminate process induced critical dimension control variation | Wilman Tsai, Frederick Chen, Jeff Farnsworth | 2002-11-26 |