KE

Karl-Ernst Ehwald

16
Patents All Time

Issued Patents All Time

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDate
9048052 Electromechanical microswitch for switching an electrical signal, microelectromechanical system, integrated circuit, and method for producing an integrated circuit Mehmet Kaynak, Mario Birkholz, Bernd Tillack, René Scholz 2015-06-02
8330237 Corrosion-resistant MEMS component and method for the production thereof Jürgen Drews, Katrin Schulz 2012-12-11
8035167 Complementary bipolar semiconductor device Dieter Knoll, Bernd Heinemann 2011-10-11
7595534 Layers in substrate wafers Bernd Heinemann, Dieter Knoll, Bernd Tillack, Dirk Wolansky, Peter Schley 2009-09-29
7323390 Semiconductor device and method for production thereof Bernd Heinemann, Dieter Knoll, Holger Rücker 2008-01-29
7307336 BiCMOS structure, method for producing the same and bipolar transistor for a BiCMOS structure Alexander J. Fox, Dieter Knoll, Bernd Heinemann, Steffen Marschmayer, Katrin Blum 2007-12-11
7304348 DMOS transistor Holger Rücker, Bernd Heinemann 2007-12-04
7284413 Method and apparatus for measuring viscosity Rudolf Ehwald, Dieter Knoll, Wolfgang Winkler, Henning Zinke 2007-10-23
6878995 Cmos-compatible lateral dmos transistor and method for producing such a transistor Bernd Heinemann, Dieter Knoll, Wolfgang Winkler 2005-04-12
6740560 Bipolar transistor and method for producing same Bernd Heinemann, Dieter Knoll 2004-05-25
6627972 Vertical bipolar transistor Dieter Knoll, Bernd Heinemann 2003-09-30
6477891 Process for affinity viscosimetry and viscosimetric affinity sensor Rudolf Ehwald, Andreas Thomas, Uwe Beyer 2002-11-12
6465318 Bipolar transistor and method for producing same Bernd Tillack, Bernd Heinemann, Dieter Knoll, Dirk Wolansky 2002-10-15
6267002 Process for affinity viscosimetry and viscosimetric affinity sensor Rudolf Ehwald, Andreas Thomas, Uwe Beyer 2001-07-31
5786609 Integrated horizontal unipolar transistor having a doped layer forming an internal gate of the transistor and at least one integrated capacitor having a first electrode connected to a source of the transistor and a second electrode to the fixed potential Josef Kemmer, Gerhard Lutz, Rainer Richter 1998-07-28
5571731 Procedure for the manufacture of bipolar transistors without epitaxy and with fully implanted base and collector regions which are self-positioning relative to each other Hartmut Gr utzediek, Joachim Scheerer, Wolfgang Winkler, Michel Pierschel 1996-11-05