Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9064085 | Method for adjusting target layout based on intensity of background light in etch mask layer | Geng Han, Wai-Kin Li | 2015-06-23 |
| 8856695 | Method for generating post-OPC layout in consideration of top loss of etch mask layer | Geng Han, Wai-Kin Li | 2014-10-07 |