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Hartmut F. Kolbe

IBM: 1 patents #44,794 of 70,183Top 65%
📍 Eppelheim, DE: #344 of 568 inventorsTop 65%
Overall (All Time): #4,055,751 of 4,157,543Top 100%
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Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
4397543 Mask for imaging a pattern of a photoresist layer, method of making said mask, and use thereof in a photolithographic process Frank A. Schwarzbach 1983-08-09