TU

Tadao Ueda

HO Honeywell: 4 patents #2,824 of 14,447Top 20%
SC Sodick Co.: 2 patents #51 of 172Top 30%
MC Mitsubishi Chemical: 1 patents #1,511 of 3,022Top 50%
Overall (All Time): #757,700 of 4,157,543Top 20%
7
Patents All Time

Issued Patents All Time

Showing 1–7 of 7 patents

Patent #TitleCo-InventorsDate
6746553 Process for producing sputtering target materials Lijun Yao 2004-06-08
6428638 Process for producing sputtering target materials Lijun Yao 2002-08-06
6423161 High purity aluminum materials Lijun Yao 2002-07-23
6416595 Material comprising titanium Lijun Yao 2002-07-09
5770831 Power supply system for an electric discharge machine Yuji Kaneko 1998-06-23
5750951 Power supply system for an electric discharge machine Yuji Kaneko, Yoshihiro Watanabe, Tatsuo Toyonaga 1998-05-12
5541007 Aluminum alloy wiring layer and aluminum alloy sputtering target Kazunari Takemura 1996-07-30