MR

Mohammed Radwan

Globalfoundries: 3 patents #1,029 of 4,424Top 25%
📍 Dresden, DE: #793 of 3,254 inventorsTop 25%
Overall (All Time): #1,518,444 of 4,157,543Top 40%
3
Patents All Time

Issued Patents All Time

Showing 1–3 of 3 patents

Patent #TitleCo-InventorsDate
9111999 Technique for reducing plasma-induced etch damage during the formation of vias in interlayer dielectrics by modified RF power ramp-up Matthias Zinke 2015-08-18
9018102 Technique for reducing plasma-induced etch damage during the formation of vias in interlayer dielectrics by modified RF power ramp-up Matthias Zinke 2015-04-28
8492279 Method of controlling critical dimensions of vias in a metallization system of a semiconductor device during silicon-ARC etch Johann Steinmetz 2013-07-23