YW

Yuichi Wakata

Fujitsu Limited: 28 patents #849 of 24,456Top 4%
FU Fujifilm: 1 patents #3,076 of 4,519Top 70%
Overall (All Time): #132,776 of 4,157,543Top 4%
29
Patents All Time

Issued Patents All Time

Showing 1–25 of 29 patents

Patent #TitleCo-InventorsDate
7303856 Light-sensitive sheet comprising support, first light-sensitive layer and second light-sensitive layer Morimasa Sato, Masanobu Takashima, Tomoko Tashiro 2007-12-04
7150955 Light-sensitive sheet comprising support, first and second light-sensitive layers and barrier layer Morimasa Sato, Masanobu Takashima, Tomoko Tashiro 2006-12-19
7070840 Inkjet recording sheet Hisao Yamada, Kazuyuki Koike, Ryoichi Nakano 2006-07-04
7041416 Photosensitive resin composition, transfer material, image forming method, color filter and producing method thereof and photomask and producing method thereof Takashi Takayanagi, Naoya Imamura, Mizuki Yamamoto 2006-05-09
6909478 Method for producing cholesteric liquid crystal color filters Mitsuyoshi Ichihashi 2005-06-21
6771336 Optical diffusion element having self-fused polymer particles free of a binder and display device equipped with the optical diffusion element Sumitaka Tatsuta 2004-08-03
6635320 Ink jet recording sheet Ryoichi Nakano, Mizuki Yamamoto 2003-10-21
6034033 Heat-sensitive recording material Toshiaki Aono, Shigetoshi Ono 2000-03-07
5916680 Thermoresponsive microcapsule, heat sensitive recording material and multicolor heat sensitive recording material Kimio Ichikawa 1999-06-29
5663212 Light-sensitive resin composition Morimasa Sato, Ken Iwakura, Yuuichi Fukushige 1997-09-02
5650263 Photopolymerizable composition, color filter, and production of color filter Masayuki Iwasaki, Koji Inoue 1997-07-22
5576140 Image-receiving sheet material, method for forming transfer image and laminate Hideyuki Nakamura 1996-11-19
5571642 Photosensitive resin composition, color filter using the same, and method of producing a color filter Koji Inoue 1996-11-05
5514518 Method of improving delamination in an image forming material utilizing 2-diazo-1,2-quinone compounds having fluorine containing substituent groups Kan Wakamatsu, Masato Satomura, Tomizo Namiki 1996-05-07
5514502 Photopolymerizable composition, color filter, and production of color filter Masayuki Iwasaki, Koji Inoue 1996-05-07
5484682 Light-sensitive bistrihalomethyl-s-triazine compound and photopolymerizable composition containing same Ken Iwakura, Hirotaka Matsumoto, Mikio Totsuka 1996-01-16
5445919 Photopolymerizable composition Masayuki Iwasaki, Koji Inoue 1995-08-29
5393640 Peel apart photosensitive material utilizing a barrier layer containing an aromatic (meth)acrylate containing copolymer with a T.sub.g under 70.degree. C. Chiyomi Niitsu 1995-02-28
5384227 Image forming materials prepared using 2-diazo-1,2-naphthoquinone compounds having fluorine atom containing substituent groups Kan Wakamatsu, Masato Satomura, Tomizo Namiki 1995-01-24
5362874 Light-sensitive bistrihalomethyl-s-triazine compounds Ken Iwakura, Hirotaka Matsumoto, Mikio Totsuka 1994-11-08
5328803 Photopolymerizable composition Sadao Fujikura, Masayuki Iwasaki 1994-07-12
5312905 2-diazo-1,2-naphthoquinone compounds Kan Wakamatsu, Masato Satomura, Tomizo Namiki 1994-05-17
5237059 Compounds capable of generating an acid by light irradiation Kan Wakamatsu 1993-08-17
5124234 Liquid light-sensitive resin composition Minoru Maeda, Masayuki Iwasaki 1992-06-23
5096799 Photopolymerizable composition Sadao Fujikura, Masayuki Iwasaki 1992-03-17